Plasma Processing                           

'Plasma', the fourth state of matter, is an essential part of the unit processes associated with microelectronic device fabrication. Our group aims to develop Cold Atmospheric Plasma (CAP) as a viable microfabrication technology. This entails fluid dynamic simulations, High voltage generation, High voltage instrumentation etc.

Thinfilm Transistos (TFTs)

TFTs are non-classical MoSFETs based on non-silicon materials. Our goup is interested in the charge transport and photoresponse of TFTs using ZnON and MoS2 as the active materials. The work entails analytical modeling, CAD simulations,  Fabrication and Characterization of TFTs using the facilities available at NIT Calicut and other centres.

B-Tech, GEC Kozhikode

MSc(Engineering), IISc Bangalore

PhD, IISc Bangalore

Scientist B, NSTL, DRDO

Research Associate, IISc 

1. Title: Development of zinc oxynitride based thindilm transistos for photosensing applications
Funding agency and scheme: NIT Calicut, Faculty Research Grant, 2019
Status: Ongoing

2. Title: Development of a diagnostic tool for Cold Atmospheric Plasma
Funding agency and scheme: SERB- Startup Research Grant, 2021
Status: Ongoing

1. Anjana J.G., Venu Anand and  Aswathi R. Nair, Surface potential based modeling of zinc oxynitride thin film transistors, IOP Flexible and Printed Electronics, Vol. 7, 2022, p. 035004
2. Anbuselvan, K.K.N., Anand, V., Krishna, Y. and Rao, M.G, Spectroscopic investigations on impurities and their effect on the electron number density in the shock tube, Journal of Quantitative Spectroscopy and Radiative Transfer, Vol 272, 2021, p.107744
3. Anjana, J.G. and Anand, V, Two Dimensional Numerical Simulation of Zinc Oxy-Nitride Thin Film Transistors, International Conference on Electronics and Sustainable Communication Systems (ICESC), 2020, pp. 1052-1055
4. Aswathi R. Nair, Venu Anand and Sanjiv Sambandan, “Bias stress induced threshold voltage shift in buckled thin film transistors,” In 2019 IEEE Region 10 Conference (TENCON 2019), pp.78-81, 17-20 Oct. 2019.
5. Anand, V., Thomas, R., Raman, K.T. and Gowravaram, M.R., 2019. Plasma-Induced Polymeric Coatings. In Non-Thermal Plasma Technology for Polymeric Materials (pp. 129-157). Elsevier.
6. Ghosh, M., Anand, V. and Gowravaram, M.R., 2018. Wetting characteristics of vertically aligned graphene nanosheets. Nanotechnology, 29(38), p.385703.
7. Anand, V., Nair, A., Karur Karunapathy Nagendirakumar, A. and Gowravaram, M.R., 2018. Estimating the number density and energy distribution of electrons in a cold atmospheric plasma using optical emission spectroscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 36(4), p.04F407.
8. Anand, V., Nair, A.R., Shivashankar, S.A. and Mohan Rao, G., Atmospheric pressure plasma chemical vapor deposition reactor for 100 mm wafers, optimized for minimum contamination at low gas flow rates. Applied Physics Letters, 107(9), p.094103, 2015.
   
9. Shaik, H. , Anand, V. and Rao, G.M. On the quality of hydrogenated amorphous silicon deposited by sputtering. Materials Science in Semiconductor Processing, 26, pp.367-373, 2014.
10. Mathew, A., Anand, V., Rao, G.M. and Munichandraiah, N., Effect of iodine concentration on the photovoltaic properties of dye sensitized solar cells for various I₂/LiI ratios. Electrochimica Acta, 87, pp.92-96, 2013.
11. Anand, V., Ghosh, S., Ghosh, M., Rao, G.M., Railkar, R. and Dighe, R.R., Surface modification of PDMS using atmospheric glow discharge polymerization of tetrafluoroethane for immobilization of biomolecules. Applied Surface Science, 257(20), pp.8378-8384, 2011.
12. Patra, S., Dash, S., Anand, V., Nimisha, C.S., Rao, G.M. and Munichandraiah, N., Electrochemical co-deposition of bimetallic Pt–Ru nanoclusters dispersed on poly (3, 4-ethylenedioxythiophene) and electrocatalytic behavior for methanol oxidation. Materials Science and Engineering: B, 176(10), pp.785-791, 2011.
    
13. Anand, V. and Gowravaram, M.R., On the purity of atmospheric glow-discharge plasma. IEEE Transactions on Plasma Science, 37(9), pp.1811-1816, 2009.

Basic Electrical Sciences (Theory; B.Tech) 

Digital Circuits and Systems (Theory & lab; B.Tech)

Electronic Circuits I (Theory & Lab; B.Tech)

Electronics Circuits II (Theory & Lab; B.Tech)

Electronic Instrumentation (Theory; B.Tech)

Nanoelectronics (Theory; BTech)

Electronic Packaging (Theory; M.Tech VLSI & EDT)

Related to Plasma Processing

Simulation

COMSOL Multiphysics

MATLAB

Experimental

Vacuum chambers

High voltage powers supplies

High voltage probe

High speed multimeter

Related to Microfabrication

Simulation

Silvaco TCAD

Experimental (fabrication)

Multi target RF Sputtering system

Single target DC Sputtering system

Thermal Evaporation system

Fume hood

Substrate Annealing and Cleaning facilities

Experimental (characterization)

DC Probe station