B-Tech: Applied Electronics & Instrumentation, Govt. Engineering College (GEC), Kozhikode

MSc(Engineering): Instrumentation & Applied Physics (IAP), Indian Institute of Science (IISc), Bangalore

PhD: Centre for Nano Science & Engineering (CeNSE), Indian Institute of Science (IISc), Bangalore

Scientist B, Naval Science & Technology Lab (NSTL), DRDO, Visakhapatnam, 2009-2010

Research Associate, Combustion Gasification Propulsion Lab (CGPL), Centre for Sustainable Technologies (CST), IISc, Bangalore, 2017-2018 

1. Anand, V., Nair, A.R., Shivashankar, S.A. and Mohan Rao, G., Atmospheric pressure plasma chemical vapor deposition reactor for 100 mm wafers, optimized for minimum contamination at low gas flow rates. Applied Physics Letters, 107(9), p.094103, 2015.
   
2. Shaik, H. , Anand, V. and Rao, G.M. On the quality of hydrogenated amorphous silicon deposited by sputtering. Materials Science in Semiconductor Processing, 26, pp.367-373, 2014.
3. Mathew, A., Anand, V., Rao, G.M. and Munichandraiah, N., Effect of iodine concentration on the photovoltaic properties of dye sensitized solar cells for various I₂/LiI ratios. Electrochimica Acta, 87, pp.92-96, 2013.
4. Anand, V., Ghosh, S., Ghosh, M., Rao, G.M., Railkar, R. and Dighe, R.R., Surface modification of PDMS using atmospheric glow discharge polymerization of tetrafluoroethane for immobilization of biomolecules. Applied Surface Science, 257(20), pp.8378-8384, 2011.
5. Patra, S., Dash, S., Anand, V., Nimisha, C.S., Rao, G.M. and Munichandraiah, N., Electrochemical co-deposition of bimetallic Pt–Ru nanoclusters dispersed on poly (3, 4-ethylenedioxythiophene) and electrocatalytic behavior for methanol oxidation. Materials Science and Engineering: B, 176(10), pp.785-791, 2011.
   
6. Anand, V. and Gowravaram, M.R., On the purity of atmospheric glow-discharge plasma. IEEE Transactions on Plasma Science, 37(9), pp.1811-1816, 2009.