Room ECED-2 : 307
Office Phone +914952286733
Mobile +919483824106
Home Address 2/18A, 'Sreepadmam', Ganapathi Kavu Road, Easthill, Westhill P.O, Kozhikode 673005
Areas Of Interest Process Technology for microfabrication, Cold Atmospheric Plasma, Nanotechnology

B-Tech: Applied Electronics & Instrumentation, Govt. Engineering College (GEC), Kozhikode

MSc(Engineering): Instrumentation & Applied Physics (IAP), Indian Institute of Science (IISc), Bangalore

PhD: Centre for Nano Science & Engineering (CeNSE), Indian Institute of Science (IISc), Bangalore


Scientist B, Naval Science & Technology Lab (NSTL), DRDO, Visakhapatnam, 2009-2010

Research Associate, Combustion Gasification Propulsion Lab (CGPL), Centre for Sustainable Technologies (CST), IISc, Bangalore, 2017-2018 

  1. Anand, V., Nair, A.R., Shivashankar, S.A. and Mohan Rao, G., Atmospheric pressure plasma chemical vapor deposition reactor for 100 mm wafers, optimized for minimum contamination at low gas flow rates. Applied Physics Letters107(9), p.094103, 2015.
  2. Shaik, H. , Anand, V. and Rao, G.M. On the quality of hydrogenated amorphous silicon deposited by sputtering. Materials Science in Semiconductor Processing26, pp.367-373, 2014.
  3. Mathew, A., Anand, V., Rao, G.M. and Munichandraiah, N., Effect of iodine concentration on the photovoltaic properties of dye sensitized solar cells for various I2/LiI ratios. Electrochimica Acta87, pp.92-96, 2013.
  4. Anand, V., Ghosh, S., Ghosh, M., Rao, G.M., Railkar, R. and Dighe, R.R., Surface modification of PDMS using atmospheric glow discharge polymerization of tetrafluoroethane for immobilization of biomolecules. Applied Surface Science257(20), pp.8378-8384, 2011.
  5. Patra, S., Dash, S., Anand, V., Nimisha, C.S., Rao, G.M. and Munichandraiah, N., Electrochemical co-deposition of bimetallic Pt–Ru nanoclusters dispersed on poly (3, 4-ethylenedioxythiophene) and electrocatalytic behavior for methanol oxidation. Materials Science and Engineering: B176(10), pp.785-791, 2011.
  6. Anand, V. and Gowravaram, M.R., On the purity of atmospheric glow-discharge plasma. IEEE Transactions on Plasma Science37(9), pp.1811-1816, 2009.