Dr. Venu Anand (Assistant Professor Grade II)
Room | ECED-1 : 202 | ![]() |
venuanand@nitc.ac.in | ||
Office Phone | +914952286703 | |
Home Address | 2/18A, 'Sreepadmam', Ganapathi Kavu Road, Easthill, Westhill P.O, Kozhikode 673005 | |
Areas Of Interest | Modelling / Fabricaton of Thinfilm Transistors (TFTs) |
Education
B-Tech: Applied Electronics & Instrumentation, Govt. Engineering College (GEC), Kozhikode
MSc(Engineering): Instrumentation & Applied Physics (IAP), Indian Institute of Science (IISc), Bangalore
PhD: Centre for Nano Science & Engineering (CeNSE), Indian Institute of Science (IISc), Bangalore
Professional Experience
Scientist B, Naval Science & Technology Lab (NSTL), DRDO, Visakhapatnam, 2009-2010
Research Associate, Combustion Gasification Propulsion Lab (CGPL), Centre for Sustainable Technologies (CST), IISc, Bangalore, 2017-2018
Publications
- Aswathi R. Nair, Venu Anand and Sanjiv Sambandan, “Bias stress induced threshold voltage shift in buckled thin film transistors,” In 2019 IEEE Region 10 Conference (TENCON 2019), pp.78-81, 17-20 Oct. 2019.
- Anand, V., Thomas, R., Raman, K.T. and Gowravaram, M.R., 2019. Plasma-Induced Polymeric Coatings. In Non-Thermal Plasma Technology for Polymeric Materials (pp. 129-157). Elsevier.
- Ghosh, M., Anand, V. and Gowravaram, M.R., 2018. Wetting characteristics of vertically aligned graphene nanosheets. Nanotechnology, 29(38), p.385703.
- Anand, V., Nair, A., Karur Karunapathy Nagendirakumar, A. and Gowravaram, M.R., 2018. Estimating the number density and energy distribution of electrons in a cold atmospheric plasma using optical emission spectroscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 36(4), p.04F407.
- Anand, V., Nair, A.R., Shivashankar, S.A. and Mohan Rao, G., Atmospheric pressure plasma chemical vapor deposition reactor for 100 mm wafers, optimized for minimum contamination at low gas flow rates. Applied Physics Letters, 107(9), p.094103, 2015.
- Shaik, H. , Anand, V. and Rao, G.M. On the quality of hydrogenated amorphous silicon deposited by sputtering. Materials Science in Semiconductor Processing, 26, pp.367-373, 2014.
- Mathew, A., Anand, V., Rao, G.M. and Munichandraiah, N., Effect of iodine concentration on the photovoltaic properties of dye sensitized solar cells for various I2/LiI ratios. Electrochimica Acta, 87, pp.92-96, 2013.
- Anand, V., Ghosh, S., Ghosh, M., Rao, G.M., Railkar, R. and Dighe, R.R., Surface modification of PDMS using atmospheric glow discharge polymerization of tetrafluoroethane for immobilization of biomolecules. Applied Surface Science, 257(20), pp.8378-8384, 2011.
- Patra, S., Dash, S., Anand, V., Nimisha, C.S., Rao, G.M. and Munichandraiah, N., Electrochemical co-deposition of bimetallic Pt–Ru nanoclusters dispersed on poly (3, 4-ethylenedioxythiophene) and electrocatalytic behavior for methanol oxidation. Materials Science and Engineering: B, 176(10), pp.785-791, 2011.
- Anand, V. and Gowravaram, M.R., On the purity of atmospheric glow-discharge plasma. IEEE Transactions on Plasma Science, 37(9), pp.1811-1816, 2009.
Courses offered
Digital Circuits and Systems / Logic Design (theory & lab) (3rd sem B.Tech)
Electronic Circuits I (Theory & Lab) (4th sem B.Tech)
Electronic Packaging (Elective: M.Tech VLSI & EDT)